CHEMKIN

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For developers who do not require the speed or advanced features of CHEMKIN-PRO, Reaction Design offers CHEMKIN as an economical alternative.

Up to 5 times faster than competitive commercial and academic codes, CHEMKIN is a robust and mature chemistry simulation tool that has been widely used for an impressive range of applications. CHEMKIN is a cost-effective solution for basic kinetics simulations that use small or reduced reaction mechanisms. CHEMKIN is 2 to 5 times faster than Chemkin II and contains numerous enhancements and corrections that have been implemented over nearly two decades of commercial CHEMKIN development. Perhaps more importantly, CHEMKIN comes with full technical support from Reaction Design, providing quick answers and advice on how to set up and analyze kinetics simulations. 

Product Literature

Title File size Last modified
CHEMKIN-PRO Overview 1 MB 04/08/2013
CHEMKIN-PRO Overview 日本語カタログ 1 MB 04/08/2013

White Papers

Title File size Last modified
Which CHEMKIN Is Right For You? 425 KB 02/11/2013

Application Notes

Automotive

Title File size Last modified
Single Zone Homogeneous Charge Compression Ignition (HCCI) Engine 67 KB 02/12/2013
Engine Exhaust Aftertreatment with a Transient Inlet Flow 89 KB 02/12/2013
Verifying Ignition Delay Predictions of a Detailed Kinetics Mechanism 174 KB 02/12/2013
Laminar Flame Speed of Stoichiometric Methane/Air Premixed Flame 45 KB 02/12/2013

Flame Calculations

Title File size Last modified
Burner-stabilized Flame 50 KB 02/13/2013
Jet Flame Analysis with an Equivalent Reactor Network 71 KB 02/13/2013
Co-Flow Non-Premixed Methane/Air Flame 89 KB 02/13/2013

Advanced Analyses

Title File size Last modified
Parameter Study Facility for Surface Chemistry Analysis 98 KB 02/13/2013
Using the Parameter-Study Facility to Vary Equivalence Ratio in Flame-speed Calculations 82 KB 02/13/2013
Using Partially Stirred Reactor to Assess Turbulence-Kinetics Interactions in a Combustor 69 KB 02/13/2013

Materials and Microelectronics

Title File size Last modified
Using CHEMKIN for Materials and Microelectronics Applications 30 KB 02/13/2013
Equilibrium Analysis of Chlorosilane Chemical Vapor Deposition (CVD) 47 KB 02/13/2013
Approximations for a Cylindrical Flow Chemical Vapor Deposition (CVD) Reactor 101 KB 02/13/2013
Deposition in a Rotating Disk Chemical Vapor Deposition (CVD) Reactor 115 KB 02/13/2013
Trichlorosilane Chemical Vapor Deposition (CVD) in a Planar Channel Flow Reactor 153 KB 02/13/2013
Steady-State Chlorine Plasma 92 KB 02/13/2013
Spatial Chlorine Plasma Plug-flow Reactor (PFR) with Power Profile 109 KB 02/13/2013
Fluorocarbon Plasma Etching of Silicon Dioxide 123 KB 02/13/2013
Time-Dependent Simulations of the Atomic Layer Deposition (ALD) Process 166 KB 02/13/2013
PSR Analysis of Steady-State Thermal Chemical Vapor Deposition (CVD) 87 KB 02/13/2013